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Trichlorosilane-SiHCl3

summary

Name:Trichlorosilane Chemical common name：硅氯仿 Formula:SiHCl3 Categories:Deposition Subclasses:Deposition Specifications:: Storage methods:

Description

Description	Trichlorosilane, also known as silicon chloroform, alias imitation silicon, trichlorosilane, Trichlorosilane, Silicochloroform. Silyl trichloroketone thereof. As a colorless, flowable liquid.
Usage	Mainly used for polysilicon, silicon materials, epitaxial growth, silicon fluid, oil, chemical vapor deposition, a silicone compound manufacturing, electronic gas.
Precautions	When trichlorosilane corrosive moisture.
By Industry	Semiconductor, chemical

1, 3 butadiene, pure hydrogen and high purity oxygen, nitrogen, argon, hydrogen, nitrogen dioxide, trimethyl bromide boron TMB, silane and silane mix other gas, hydrogen, nitrogen trifluoride selenide, boron trifluoride, liquid ammonia, etching gas, electronic gas, six fluoride oxide, hydrogen sulfide, and methane, high pure butane, high purity isobutane methane, high purity, high purity, high purity propane butane, high-purity propylene and isobutylene, butadiene, ethane, butene, anti - 2 - butene, propylene, propiolic, vinyl acetylene, ethyl acetylene, carbonyl sulfur, allene, sulfur hexafluoride, new pentane, carbon tetrafluoride, eight fluorine cyclobutane, nitric oxide, high purity nitrous oxide (n2o), hydrogen chloride, high purity helium, ultrapure, ultra pure nitrogen, pure argon and helium gas standard.Trimethyl gallium, trimethyl indium gallium, trimethyl aluminum, triethyl, triethyl indium, diethyl zinc, zinc dimethyl, dicyclopentadienyl magnesium source (MO)