Description | Phosphine is important in semiconductor device manufacturing N-type dopant source, but also for phosphine chemical vapor deposition of polysilicon, epitaxial Ga P materials, ion implantation process, MO CVD process, phosphorus silicate glass (PSG) passivation film was prepared and other processes. |
Usage | |
Precautions | Colorless, toxic, flammable gas with a garlic flavor annoying. |
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